Submicrometer microelectronics dimensional metrology: scanning electron microscopy

Scanning Electrochemical Microscopy : Preparation of Submicrometer Electrodes

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Micromachined submicrometer photodiode for scanning probe microscopy

Scanning electron microscope dimensional metrology using a model-based library

The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are smaller than the spatial resolution of edges in the scanning electron microscope (SEM) that is used to perform the measurements. Image processing te...

Submicrometer Linewidth Metrology

In 1987, the semiconductor industry was undergoing a technological transition into the submicrometer range of device dimensions. Small dimensions that are very important to device performance or yield are called critical dimensions (CD). Optical metrology technology was adequate to measure the critical dimensions above 1 m, but as these dimensions shrunk into the submicrometer regime, the indus...

Critical Issues in Scanning Electron Microscope Metrology

National Institute of Standards and Technology, Gaithersburg, MD 20899-0001 During the manufacturing of presentday integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of repeatability. Optical microscopy, scanning electron microscopy, and the various forms of scanning probe microscopies are major microscopical techniques...